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Home » Product Directory » Metallurgy, Mineral & Energy » Non-ferrous Metal & Products » Mo Sputtering Target

Mo Sputtering Target

Mo Sputtering Target
Mo Sputtering Target
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Product Description

Our company produces various kinds of Metal target materials and Alloy target materials by smelting and powder metallurgy, we can provide customer with tantalum target and Niobium target which are of different types and used in production of various kinds of thin film materials and chemical industries.

The size is:
Thickness: 0.1mm~15mm, Length≤2000mm,
Wide≤450mm
The purity is: ≥99.95%
The Surface is: ≤32Rms
The flatness is: ≤1.5%

   
Company: Fongre Rare Material Co., Ltd.

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