Basic Info.
Model NO.
OXFORD Plasmapro100
Product Description
Oxford Instruments' PlasmaPro 100 PECVD
Oxford Instruments' PlasmaPro 100 process modules offer a 200mm platform with
single wafer and multi-wafer batch capability. The process modules offer excellent
uniformity, high throughput and high precision processes.
Our tools are well proven, with over 90% uptime and processes that are guaranteed to ensure rapid start-up during installation.
The PlasmaPro 100 range supports a number of markets including but not limited to; MEMS & Sensors, Optoelectronics,
Discrete Devices and Nanotechnology. It is flexible enough to be used in research and development, with the
build quality to satisfy production needs.
PlasmaPro 100 platforms may be clustered to combine technologies
and processes with either cassette or single wafer loading options
• Compatible with all wafer sizes up to 200mm
• Rapid change between wafer sizes
• Global customer support network
• Low cost of ownership and ease of serviceability
• Compact footprint, flexible layout
• CE marked, safety compliant to EN 13849-1 Oxford Instruments PC4500 software is renowned for its clarity and ease of use, making it quick
to train process operators while retaining full functionality for users.Software features:
• The front end visual interface is configured exactly for your system
• Control a tool cluster from a single interface and PC
• Process recipes are written, stored and recalled through the same software, building a library
• Password controlled user login allows different levels of user access and tasks, from 'one-button' run operation
to full system functions
• Advanced Graphical Log Viewer:
• Continuous system data logging ensures traceability
of each wafer and process run
• Quickly graph parameters from multiple runs on one
or more graphs
• Save graph of a "gold standard" run to easily
compare against data from subsequent runs
• Quick scroll and zoom graph axes
The PECVD process modules are specifically designed to produce excellent uniformity and
high rate films, with control of film properties such as refractive index, stress, electrical
characteristics and wet chemical etch rate.PECVD features:
• In-situ chamber cleaning and end-pointing
• Electrically grounded lower electrodes available:
• 400ºC electrode - typical processes are SiO2 , Si3 N4 and
SiON, amorphous Si and SiC
• 1200ºC electrode - in addition to processes above,
the electrode enables Si Nanowires, high temperature
PECVD films with a wide variety of chemistries
• An optimised upper electrode design , operating in high
pressure, high RF power, high flow regimes, enables SiO2 ,
Si3 N4 and SiON, amorphous Si deposition at increased rates
whilst maintaining excellent film properties and uniformity
across the wafe• RF powered showerhead with optimised gas delivery,
provides uniform plasma processing with LF/RF switching
allowing precise control of film stress
Address:
No. 125, Tangqing West Road, Shitanpu Tangxia Dongguan Guangdong Cn 523717, Dongguan, Guangdong, China
Business Type:
Manufacturer/Factory
Business Range:
Consumer Electronics, Electrical & Electronics, Industrial Equipment & Components, Instruments & Meters, Lights & Lighting, Manufacturing & Processing Machinery, Metallurgy, Mineral & Energy, Security & Protection, Sporting Goods & Recreation, Tools & Hardware
Company Introduction:
Dongguan Boldward Communication Technology Co., Ltd. Possesses a complete set of production management, quality control and product testing procedures. Our main business includes environmental test chambers, generator equipment, generator remote control systems, testing instruments for the photovoltaic industry, semiconductor industry, photovoltaic power station, and other customized quality inspection instruments, as well as the development of testing system software. We also provide one-stop services for laboratory project planning, design, production, installation and after-sales service.