2,789 Tantalum Target
results from68 suppliers
High Ductility Vacuum Coating Chrome Tantalum Target
- Classification: Precious Metal
- Size: Dia100*45
- Material: Chrome
- Composition: 99.97%Chrome
- Thread Size: M90*2
- Packing: Export Package
ACETRON 4N 99.99% High Purity Tantalum Sputtering Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Plate
- Certification: ISO
- Purity: 99.99%
- Thickness: 1mm~30mm(Can be more thicker as your request)
- Width: Max: 2000mm
99.95% Pure Tantalum Sputtering Target High Purity Ta Tantalum Target for Sputtering
- Type: Metal Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.95%-99.99%
- Size: Customized
- MOQ: 1 PC
99.95%Min 3n5 Tantalum Sputtering Target
- Type: Metal Target
- Shape: Round
- Certification: ISO
- Packing: Wooden Box Package
- Standard: 99.95%
- Port: Changsha
99.95% Pure Ta/Tantalum Sputter/Sputtering Target for Sputtering Machine
- Type: Metal Target
- Shape: Square
- Certification: TUV, ISO, CE
- Purity: 99.95%
- Size: Customized
- MOQ: 1 PC
ACETRON 4N 99.99% High Purity Tantalum Rotatable Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Rotary
- Certification: ISO
- Material: Tantalum
- Purity: 99.99%
- Minimum ID: 56mm
Ta-Mo Alloy Plate Tantalum Molybdenum Sputtering Target
- Application: Aviation, Electronics, Industrial, Medical
- Standard: GB, ASTM, AISI
- Purity: >99.95%
- Alloy: Non-alloy
- Type: Round Targets
- Powder: Not Powder
99.95% Pure Tantalum Sputtering Target for Thin Film Coating
- Type: Metal Target
- Shape: Plate
- Certification: TUV, ISO, CE
- Purity: 99.95%-99.99%
- Material: Tantalum
- Size: Customized
ACETRON 4N 99.99% High Purity Tantalum Rotating Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Rotary
- Certification: ISO
- Material: Tantalum
- Purity: 99.99%
- Minimum ID: 56mm
High Quality Steel Grey Tantalum Round Target
- Classification: Rare Metal
- Size: as Request
- Composition: Tantalum
- Processing Equipment: CNC Lathe
- Thread Size: as Request
- Powder: Not Powder
Ta2o5 Tantalum Oxide Sputtering Target for Magnetron Coating
- Type: Ceramic Target
- Shape: Round
- Certification: TUV, ISO, CE
- Dimension: 50.8mm Dia. X 3.175mm
- Purity: 99.99%
- Application: Experiment,Thin Film Coating
99.999% High Purity Tantalum Ta Sputtering Target Plate /Tantalum Ta Metal Target
- Application: Industrial
- Formula: Tantalum
- Classification: Metal Traget
- Grade Standard: Industrial Grade
- Certification: ISO
- Shape: Rotary,Flat,Round
R05200 Tantalum Target for Electronics Purpose
- Characteristic: Extremely High Corrosion Resistance
- Protection: Resistance to Corrosion, High Melting Point
- Usage: Alloys, Electronics
- Shape: Target
- Concentrate or Not: Non-concentrate
- Packing: Wooden Case
ACETRON 4N 99.99% High Purity Tantalum Round Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Round
- Certification: ISO
- Purity: 99.99%
- Thickness: 1mm~30mm(Can be more thicker as your request)
- Width: Max: 2000mm
Higher Purity 3n5 99.95% Ductility Tantalum Sheet Sputtering Target for Vacuum Coating
- Type: Metal Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.9%-99.99%
- Size: D50.8X3mm,D3X3mm, D50.8X3mm, or as Your Request
- OEM: Support
ACETRON 4N 99.99% High Purity Tantalum Pipe Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Rotary
- Certification: ISO
- Material: Tantalum
- Purity: 99.99%
- Minimum ID: 56mm
99.9% Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering Target
- Type: Metal Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.9%-99.99%
- Size: D50.8X3mm,D3X3mm,2inch,3inch, or as Your Request
- OEM: Support
ACETRON 4N 99.99% High Purity Tantalum Tubular Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Rotary
- Certification: ISO
- Material: Tantalum
- Purity: 99.99%
- Minimum ID: 56mm
High Purity Tantalum Metal Sputtering Target for Thin Film Coating, Titanium/Rhodium /Ruthenium Sputtering Target
- Shape: Round
- Certification: ISO
- Chemical Composition: Tantalum
- Packing: Vacuum Packed or Per Customer's Request.
- Port: Changsha
- Production Capacity: 10000000 Kilogram/Kilograms Per Month
99.95% High Purity Tantalum Metal Sputtering Target for Thin Film Coating
- Shape: Round
- Certification: ISO
- Chemical Composition: Tantalum
- Packing: Vacuum Packed or Per Customer's Request.
- Port: Changsha
- Production Capacity: 10000000 Kilogram/Kilograms Per Month
Higher Purity Silver Gray Ductility Tantalum Sheet Target for Vacuum Coating
- Type: Tantalum Sheet Target
- Application: Industrial, Vacuum Coating
- Technique: Forged
- Grade: Ta1
- Shape: Square
- Size: as Request
PVD Target 3n5 4n High Purity Tantalum Sputtering Target
- Type: Metal Target
- Shape: Circular, Rectangular
- Certification: ISO
- Usage: PVD Coating Industry
- Advantage: High Density, High Purity
- Product Name: Tantalum Sputtering Target
ACETRON 4N 99.99% High Purity Tantalum Planar Sputtering Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Plate
- Certification: ISO
- Purity: 99.99%
- Thickness: 1mm~30mm(Can be more thicker as your request)
- Width: Max: 2000mm
Factory Direct Sale High Purity 99.95%Min Tantalum Metal Ta Sputtering Target for Thin Film Coating
- Type: Metal Target
- Shape: Round
- Certification: ISO
- Chemical Composition: Tantalum
- Packing: Vacuum Packed or Per Customer's Request.
- Standard: Customized according to customer requirements
99.99% Tantalum Sputter Target Metal Tantalum Target for Sputtering
- Type: Metal Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.95%-99.995%
- Size: Customized
- MOQ: 1 PC
Ta Target Tantalum Sputtering Target/Tantalum Rotary Target for Semiconductor
- Type: Metal Target
- Certification: ISO, CE
- Purity: >5n 99.999%
- Color: Silver
- Size: Customized
- Packing: Wooden Case
ACETRON 4N 99.99% High Purity Tantalum Tube Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Rotary
- Certification: ISO
- Material: Tantalum
- Purity: 99.99%
- Minimum ID: 56mm
Nicocralyta Alloy Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering Targets
- Type: Alloy Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.9%-99.99%
- Size: D50.8X3mm,D3X3mm, D50.8X3mm, or as Your Request
- OEM: Support
ACETRON 4N 99.99% High Purity Tantalum Rotary Sputtering Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Rotary
- Certification: ISO
- Material: Tantalum
- Purity: 99.99%
- Minimum ID: 56mm
Tantalum Target, Ta Sputtering Target
- Characteristic: High Capacitance
- Protection: Resistance to Corrosion, High Melting Point
- Usage: Electronics
- Shape: Powder
- Concentrate or Not: Concentrate
- Packing: Wooden Box Package
Tantalum Plate Sputtering Target for Magnetron Coating
- Type: Metal Target
- Shape: Rectangle
- Certification: TUV, ISO, CE
- Purity: 99.95%-99.99%
- Material: Tantalum
- Size: Customized
ACETRON 4N 99.99% High Purity Ta Rotatable Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Rotary
- Certification: ISO
- Material: Tantalum
- Purity: 99.99%
- Minimum ID: 56mm
99.9% Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering Target for PVD Process
- Type: Alloy Target
- Shape: Round
- Certification: ISO
- Packaging: 1PC Vacuum Package
- Purity: 99.9%-99.99%
- Size: Customized
Polish Pure Tantalum Round Target for Manufacture Tantalum Capacitors
- Size: According to Your Requirement
- Purity: 99.9%
- Processing Equipment: CNC Lathe
- Thread Size: as Request
- Packing: Carton
- Standard: No. 1
China Manufacturer Tantalum Plate Tantalum Sheet Tantalum Target Price
- Characteristic: High Capacitance
- Protection: Resistance to Corrosion, High Melting Point
- Usage: Electronics
- Shape: Powder
- Concentrate or Not: Concentrate
- Packing: Wooden Box Package
ACETRON 4N 99.99% High Purity Ta Tubular Target for Vacuum/PVD Coating
- Type: Metal Target
- Shape: Rotary
- Certification: ISO
- Material: Tantalum
- Purity: 99.99%
- Minimum ID: 56mm
Tantalum Bar/ Tantalum Sheet/ Tantalum Rod /Tantalum Target
- Characteristic: Stable Electrical Behavior
- Protection: High Melting Point
- Usage: Electronics
- Shape: Sheet/Bar
- Concentrate or Not: Concentrate
- Surface Condition: Polished,Ground,Rolled
Nicocralyta 99.9% Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering Target
- Type: Alloy Target
- Shape: Round
- Certification: ISO
- Packaging: 1PC Vacuum Package
- Purity: 99.9%-99.99%
- Size: Customized
ACETRON High Purity Zirconium Titanium Oxide Mixture ZrO2+Ti3O5 Granules Evaporation Materials/Sputtering Target
- Type: Oxide
- Shape: Granules/Pellets
- Certification: ISO
- Product Name: Zirconium Tantalum Oxide
- Chemical Formula: ZrO2+Ti3O5
- Melting Point: 1800ºC
4n Pure Ta Tantalum Sputtering Target
- Type: Metal Target
- Shape: Rectangle
- Certification: TUV, ISO, CE
- Dimension: Customized
- Purity: 99.99%
- Application: PVD Coating