Min. Order Reference FOB Price
1400 kg US$25.00-50.00 / kg
Product Description
It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma etching gas in the microelectronics industry. It is the class 2.2 toxic gas, and its maximum allowable content in the air is 29mg/m3. Nitrogen trifluoride is an etchant ...