Sputtering Target Material

5,234 results for Sputtering Target Material

Alloy Target · Round

Titanium Vanadium PVD Coating Material Tiv (50/50at%) for Sputtering Targets

US$ 45-100 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supply: Premier, High-Purity 99.5% Titanium Vanadium PVD Coating Material TiV (70/30wt%) - Exceptional Quality and Competitive Pricing for Sputtering Targets Name Metal Titanium vanadium Sputtering Targets (TiVTarget) TiV7wt% TiV28wt% TiV50at% etc Material

ISO · Round · Ceramic Target

Factory Supply Ceramic Nb2o5 Sputtering Target Material with 99.99% Purity

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Niobium Pentoxide Sputtering Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy

Round · Ceramic Target · ISO

High Purity Tantalum Nitride Sputtering Target Tan Target Material for PVD Coating

US$ 500-1000 / Piece
1 Piece  (MOQ)
Product Name: High Purity Tantalum Nitride Sputtering Target TaN Category: Target Material Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film tec

Ceramic Target · Round

High Purity 99.9% Iron Sulfide Sputtering Target Material

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Iron Sulfide Sputtering Target FeS Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy Sintering Quotation We are factory and can smelt according to customer's alloy ratio. For details, please cont

ISO · Plate · Ceramic Target

High Purity Boron Nitride Sputtering Target 99.9% Customized Size Ceramic Materials

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Boron Nitride sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact th

Round · Ceramic Target · ISO

Customize Size Zinc Selenide Sputtering Target Znse Ceramic Coating Material

US$ 50-100 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supplies Premier 99.95% Zinc Selenide Target ZnSe Ceramic Sputtering Target for Superior Coating Applications Name 99.95% Zinc Selenide Target Ceramic Sputtering Target (ZnSe Targets) Material Zinc Selenide Ceramic Materials Purity 99.9%-99.99% 3N,3N5,4

Alloy Target · Round

Custom Tiv (93/7wt%) Titanium Vanadium PVD Coating Material for Sputtering

US$ 45-100 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supply: Top-Ranking, Competitively Priced 99.5% Purity High-Purity TiV (70/30wt%) Titanium Vanadium Alloy Target for Superior Coating Applications Name Metal Titanium vanadium Sputtering Targets (TiVTarget) TiV7wt% TiV28wt% TiV50at% etc Material Titanium

ISO · Round · Alloy Target

Premium Customized Zinc Aluminum Sputtering Material for Industrial Applications

US$ 75-85 / Piece
1 Piece  (MOQ)
Product Description Product Name Aluminum zinc alloy target Available Purity 99.5%min,as you request Available shape round, rectangular,pellets Size 1'-10''mm,As per your request Technolgy Sintering Quotation We are factory and can smelt according to customer's alloy ratio. For detail

Round · Ceramic Target · ISO

Customizable Tin Ceramic Sputtering Material with Copper Plate

US$ 85-200 / Piece
1 Piece  (MOQ)
Product Description Introducing the XinKang Factory's premier offering: the Top Ranking 99.9% TiN Ceramic Target - a Titanium Nitride Sputtering Target skillfully combined with a Copper Backing Plate. Perfect for optical coating applications, this product epitomizes excellence, ensuring that you

Round · Ceramic Target · ISO

Optical Coating Molybdenum Disulfide Sputtering Material

US$ 100-200 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Presents: Premier MoS2 Ceramic Sputtering Target Material - Molybdenum Disulfide Target for Exceptional Optical Coating Applications Name Molybdenum Disulfide Target Ceramic Sputtering Target (MoS2 Targets) Material Molybdenum DisulfideCeramic Materials P
  • QWhat are the latest trends in Sputtering Target Material manufacturing?

    Recent trends in Sputtering Target Material manufacturing highlight sustainable practices and advanced coatings. Major factory innovations focus on reducing costs while offering OEM solutions. Learn how to stay ahead in Sputtering Target Material trends by partnering with top industry suppliers for high-performance outcomes.

  • QHow can I find competitive prices for Sputtering Target Materials?

    Finding competitive prices involves consulting with multiple suppliers and considering factors like factory-direct options and distributor offers. Factory partnerships often offer wholesale pricing or bulk discounts. Engage with trusted distributors to compare costs and secure the most economical deals for your projects.

  • QCan Sputtering Target Materials be customized for specific applications?

    Yes, many suppliers provide custom Sputtering Target Material solutions to fit specific industrial requirements. Working directly with a supplier's OEM department can ensure materials meet precise specifications. Customization not only aids specialized applications but also enhances project outcomes at competitive price points. Contact popular vendors to design the perfect solution.

Round · Ceramic Target · ISO

Premium Tin Ceramic Sputtering Material for Enhanced Optical Coatings

US$ 85-200 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supply Top-Ranking 99.9% TiN Ceramic Target - Titanium Nitride Sputtering Target with Copper Backing Plate for Advanced Optical Coatings Name Titanium Nitride Target Ceramic Sputtering Target (TiN Targets) Material Titanium Nitride Ceramic Materials Purit

Alloy Target · ISO

Advanced Aluminum Zinc Sputtering Material for Semiconductor Industry Use

1 pieces  (MOQ)
Products Description Product Name Aluminum Zinc Sputtering Target (Popular AlMg10wt% AlMg4wt%) Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Available purity 99.9% 99.99% Available size D50.8mm D101.6mm support customized Density / Melting / Technology

Alloy Target · ISO

High Purity Aluminum Titanium Sputtering Material for PVD Coating

US$ 50-1200 / Piece
1 Piece  (MOQ)
Product Name: High-Purity Aluminum Titanium Sputtering Target for Metal Processing Machinery Category: Target Material Keywords: High-purity aluminum titanium target, Metal processing machinery parts, Aluminum titanium sputtering material, Aluminum titanium alloy target, High-purity metal sputteri

ISO · Round · Alloy Target

High Purity Zinc Aluminum Alloy Sputtering Material

US$ 75-85 / Piece
1 Piece  (MOQ)
Product Name Aluminum zinc alloy target Available Purity 99.5%min,as you request Available shape round, rectangular,pellets Size 1'-10''mm,As per your request Technolgy Sintering Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sa

Round · Ceramic Target · ISO

High-Quality Tic Sputtering Material for Optical Coating Applications

US$ 85-200 / Piece
1 Piece  (MOQ)
Product Description Unveiling the XinKang Factory's premier offering: The top-ranking Xinkang 99.9% TiC Titanium Carbon Ceramic Sputtering Target. Crafted for excellence in film coating, this is the quintessential choice for those seeking superior performance in advanced optical coatings. Name

Alloy Target · Pipe

Custom Niv7 Sputtering Targets 99.9% Pure Nickel Vanadium Alloy Material Supplier

US$ 55-120 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Presents: Supreme Quality 99.9%-99.995% Purity NiV Magnetron Nickel Vanadium Sputtering Target NiV7wt% for PVD Coating Name Metal Nickel Vanadium Alloy Sputtering Targets (NiV7 Targets) Material Nickel Vanadium Alloy Metal Materials Purity 99.9%-99.995%,

Round · Ceramic Target · ISO

Semiconductor Grade Tantalum Nitride Sputtering Target Tan Thin Film Material

US$ 500-1000 / Piece
1 Piece  (MOQ)
Product Name: High Purity Tantalum Nitride Sputtering Target TaN Category: Target Material Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film techno

Metal Target · Round

High Purity Gold Sputtering Target Material Custom Processing

US$ 350000 / Piece
1 Piece  (MOQ)
Since the year 2009, our company has been investing and developing the technology of vacuum sputtering thin film coating and evaporation coating for chips of semi-conductor and mirco-electronics, etc. Under technical supports from reserch institutes and doctors/professors of overseas returnees, afte

ISO · Plate · Alloy Target

OEM Customized Aluminum Silicon Alloy Target 99.999% Alsi 99/1wt% Sputtering Material

US$ 75-90 / Piece
1 Piece  (MOQ)
Product Description Product Name Aluminum silicom sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8'',As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For

ISO · Round · Ceramic Target

High Purity Ceramic Niobium Pentoxide Sputtering Target Material for Vacuum Packaging

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Niobium Pentoxide Sputtering Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy

High Purity Sputter Coating Platinum Target, Pure 99.95% Platinum Metal Magnetron Sputtering Target Material

US$ 33000-70000 / Piece
1 Piece  (MOQ)
Product Description Platinum target Pt≥99.95% Pt≥99.95% Diameter 20300mm, thickness 160mm according to requirements Application:sputter coating Impurity element ≯ Pd Ru Rh Ir Au Ag Cu Fe Ni 0.01 0.02 0.02 0.02 0.01 0.005 0.005 0.005 0.005 Al Pb Mn Mg Sn Si

Metal Target · Round

99.99% Pure W Tungsten Sputtering Target Tungsten Metal Material

US$ 17-55 / kg
1 kg  (MOQ)
W Tungsten Sputtering Target CAS 7440-33-7 Product Name: W Tungsten Sputtering Target Purity: 99.95%; 2N7,4N,4N5,5N Color: Metallic Color Surface: Polished Surface Shape: Flat target, Rotating target Application:X-Ray Generation, Electron Beam Evaporation, High-Temperature Components Product

ISO · Plate · Ceramic Target

Boron Nitride Sputtering Target 99.9% Ceramic Materials Customized Size

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Boron Nitride sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact th

Round · Ceramic Target · ISO

Zrb2 Material Disk for Magnetron Sputtering

US$ 150-1000 / Piece
1 Piece  (MOQ)
Product Description Zirconium diboride is an advanced engineering material, heralded for its remarkable versatility across various fields. Boasting impressive characteristics, such as an exceptionally high melting point, formidable hardness, unparalleled stability, excellent electrical and therm

Alloy Target · ISO

99.95% Metal Niv7 Rotary Tube Nickel Vanadium Alloy Target Material with Polished Surface

US$ 50-2000 / Piece
1 Piece  (MOQ)
Product Description XinKang Top Ranking Competitive Price Customized Polished Surface 99.95% High Purity NiV7 Nickel Vanadium Alloy Target for PVD Process Name Metal Nickel Vanadium Alloy Sputtering Targets Purity 99.9%-99.99% Size D50.8x3mm, D76.2x6mm,2inch,3inch, As request Ni Boiling

Ultra Pure Boron Sputtering Material for Photovoltaic Devices

US$ 100-1000 / pieces
1 pieces  (MOQ)
Product Description The following table is a component analysis certificate for 3N Boron sputtering target. The analytical methods used are: 1. Analysis of metal elements using GDMS or ICP-OES; 2. Gas element analysis using LECO. Company Information Packaging & Shippi

Alloy Target · ISO

99.95% Pure Niti Sputtering Material Niti Sputter Coating Targets

US$ 50-1000 / Piece
1 Piece  (MOQ)
Product Description Introducing our top-tier NiTi Sputtering Target, precision-engineered to meet the sophisticated demands of cutting-edge applications. Material: Composed of high-quality NiTi, ensuring unmatched performance and reliability. Available purity: Achieves an impressive 99.9% purity

Round · Ceramic Target · ISO

High Purity Tin Ceramic Sputtering Material for Optical Coating Applications

US$ 85-200 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supply Top-Ranking 99.9% TiN Ceramic Target Titanium Nitride Sputtering Target with Copper Backing Plate for Advanced Optical Coatings Name Titanium Nitride Target Ceramic Sputtering Target (TiN Targets) Material Titanium Nitride Ceramic Materials Purity

ISO · Rotary · Alloy Target

Hot Sell Vacuumm Coating Sputtering Target Cuzu Cylindrical Target Material

US$ 0.01-0.09 / Piece
1 Piece  (MOQ)
Rotatable CuZn target Application: Mainly used for producing pure Cu film, widely used in Decorative glass mirror film, PCB plate, TFT-LCD, Low-E glass film, semiconductor electronics. Physical and Chemical Properties Chemical Composition: CuZn Molding process: Spray Density: ≥8.57g/cm3 (

Round · Ceramic Target · ISO

Customized Batio3 Target Bto Ceramic Coating Material

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Name: Batio3 Barium Titanium Oxide BTO Ceramic Sputtering Target Category: Target Material Keywords: Batio3 Target, Barium Titanium Oxide, BTO Ceramic Sputtering Target Description: Elevate your sputtering processes with our premium Batio3 Barium Titanium Oxide Ceramic Sputtering Targ
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