Sputtering Target Material

5,556 results for Sputtering Target Material

ISO · Ceramic Target · Round

Factory Supply Ceramic Nb2o5 Sputtering Target Material with 99.99% Purity

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Niobium Pentoxide Sputtering Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy

ISO · Ceramic Target · Round

High Purity Ceramic Niobium Pentoxide Sputtering Target Material for Vacuum Packaging

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Niobium Pentoxide Sputtering Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy

ISO · Ceramic Target · Plate

High Purity Boron Nitride Sputtering Target 99.9% Customized Size Ceramic Materials

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Boron Nitride sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact th

Ceramic Target · Round

High Purity 99.9% Iron Sulfide Sputtering Target Material

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Iron Sulfide Sputtering Target FeS Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy Sintering Quotation We are factory and can smelt according to customer's alloy ratio. For details, please cont

ISO · TUV · CE

High Purity Tantalum Nitride Sputtering Target Tan Target Material for PVD Coating

US$ 500-1000 / Piece
1 Piece  (MOQ)
Product Name: High Purity Tantalum Nitride Sputtering Target TaN Category: Target Material Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film tec

Alloy Target · Round

Titanium Vanadium PVD Coating Material Tiv (50/50at%) for Sputtering Targets

US$ 45-100 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supply: Premier, High-Purity 99.5% Titanium Vanadium PVD Coating Material TiV (70/30wt%) - Exceptional Quality and Competitive Pricing for Sputtering Targets Name Metal Titanium vanadium Sputtering Targets (TiVTarget) TiV7wt% TiV28wt% TiV50at% etc Material

ISO · TUV · CE

Semiconductor Grade Tantalum Nitride Sputtering Target Tan Thin Film Material

US$ 500-1000 / Piece
1 Piece  (MOQ)
Product Name: High Purity Tantalum Nitride Sputtering Target TaN Category: Target Material Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film techno

ISO · TUV · CE

Customize Size Zinc Selenide Sputtering Target Znse Ceramic Coating Material

US$ 50-100 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supplies Premier 99.95% Zinc Selenide Target ZnSe Ceramic Sputtering Target for Superior Coating Applications Name 99.95% Zinc Selenide Target Ceramic Sputtering Target (ZnSe Targets) Material Zinc Selenide Ceramic Materials Purity 99.9%-99.99% 3N,3N5,4

ISO · TUV · CE

High-Quality Tic Sputtering Material for Optical Coating Applications

US$ 85-200 / Piece
1 Piece  (MOQ)
Product Description Unveiling the XinKang Factory's premier offering: The top-ranking Xinkang 99.9% TiC Titanium Carbon Ceramic Sputtering Target. Crafted for excellence in film coating, this is the quintessential choice for those seeking superior performance in advanced optical coatings. Name

Alloy Target · Round

Custom Tiv (93/7wt%) Titanium Vanadium PVD Coating Material for Sputtering

US$ 45-100 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supply: Top-Ranking, Competitively Priced 99.5% Purity High-Purity TiV (70/30wt%) Titanium Vanadium Alloy Target for Superior Coating Applications Name Metal Titanium vanadium Sputtering Targets (TiVTarget) TiV7wt% TiV28wt% TiV50at% etc Material Titanium
  • QWhat are the common types of Sputtering Target Materials used in manufacturing processes?

    Sputtering Target Materials used in manufacturing include metals, alloys, and ceramics. Each type has unique properties that make them suitable for specific applications. A reputable supplier can provide guidance on selecting the right material for your manufacturing needs.

  • QHow can I differentiate between reliable Sputtering Target Material suppliers in China?

    To identify reliable suppliers in China, research online platforms, attend industry exhibitions, and seek referrals. Look for suppliers with quality certifications and a strong track record. Partnering with a well-known manufacturer ensures consistent quality and timely delivery.

  • QWhat advantages does purchasing Sputtering Target Material wholesale offer?

    When you buy Sputtering Target Material in wholesale quantities, you benefit from competitive pricing, bulk availability, and customized options. Wholesale orders often come with discounts and flexible terms, making it a cost-effective and convenient choice for manufacturers.

ISO · TUV · CE

High Purity Tin Ceramic Sputtering Material for Optical Coating Applications

US$ 85-200 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supply Top-Ranking 99.9% TiN Ceramic Target Titanium Nitride Sputtering Target with Copper Backing Plate for Advanced Optical Coatings Name Titanium Nitride Target Ceramic Sputtering Target (TiN Targets) Material Titanium Nitride Ceramic Materials Purity

ISO · Alloy Target · Round

High Purity Zinc Aluminum Alloy Sputtering Material

US$ 75-85 / Piece
1 Piece  (MOQ)
Product Name Aluminum zinc alloy target Available Purity 99.5%min,as you request Available shape round, rectangular,pellets Size 1'-10''mm,As per your request Technolgy Sintering Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sa

ISO · TUV · CE

Customizable Tin Ceramic Sputtering Material with Copper Plate

US$ 85-200 / Piece
1 Piece  (MOQ)
Product Description Introducing the XinKang Factory's premier offering: the Top Ranking 99.9% TiN Ceramic Target - a Titanium Nitride Sputtering Target skillfully combined with a Copper Backing Plate. Perfect for optical coating applications, this product epitomizes excellence, ensuring that you

ISO · Alloy Target · Round

Premium Customized Zinc Aluminum Sputtering Material for Industrial Applications

US$ 75-85 / Piece
1 Piece  (MOQ)
Product Description Product Name Aluminum zinc alloy target Available Purity 99.5%min,as you request Available shape round, rectangular,pellets Size 1'-10''mm,As per your request Technolgy Sintering Quotation We are factory and can smelt according to customer's alloy ratio. For detail

ISO · TUV · CE

Optical Coating Molybdenum Disulfide Sputtering Material

US$ 100-200 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Presents: Premier MoS2 Ceramic Sputtering Target Material - Molybdenum Disulfide Target for Exceptional Optical Coating Applications Name Molybdenum Disulfide Target Ceramic Sputtering Target (MoS2 Targets) Material Molybdenum DisulfideCeramic Materials P

ISO · TUV · CE

Premium Tin Ceramic Sputtering Material for Enhanced Optical Coatings

US$ 85-200 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Supply Top-Ranking 99.9% TiN Ceramic Target - Titanium Nitride Sputtering Target with Copper Backing Plate for Advanced Optical Coatings Name Titanium Nitride Target Ceramic Sputtering Target (TiN Targets) Material Titanium Nitride Ceramic Materials Purit

Alloy Target · ISO

Advanced Aluminum Zinc Sputtering Material for Semiconductor Industry Use

1 pieces  (MOQ)
Products Description Product Name Aluminum Zinc Sputtering Target (Popular AlMg10wt% AlMg4wt%) Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Available purity 99.9% 99.99% Available size D50.8mm D101.6mm support customized Density / Melting / Technology

Alloy Target · ISO

High Purity Aluminum Titanium Sputtering Material for PVD Coating

US$ 50-1200 / Piece
1 Piece  (MOQ)
Product Name: High-Purity Aluminum Titanium Sputtering Target for Metal Processing Machinery Category: Target Material Keywords: High-purity aluminum titanium target, Metal processing machinery parts, Aluminum titanium sputtering material, Aluminum titanium alloy target, High-purity metal sputteri

Metal Target

Lanthanum La Sputtering Targets Rare Earth Metal Material

US$ 150-350 / Piece
1 Piece  (MOQ)
Product Description Target material is the target material bombarded by high-speed charged particles. By replacing different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), different film systems (such as superhard, wear-resistant, corrosion-resistant a

ISO · Alloy Target · Plate

OEM Customized Aluminum Silicon Alloy Target 99.999% Alsi 99/1wt% Sputtering Material

US$ 75-90 / Piece
1 Piece  (MOQ)
Product Description Product Name Aluminum silicom sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8'',As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For

Metal Target · Round

99.99% Pure W Tungsten Sputtering Target Tungsten Metal Material

US$ 17-55 / kg
1 kg  (MOQ)
W Tungsten Sputtering Target CAS 7440-33-7 Product Name: W Tungsten Sputtering Target Purity: 99.95%; 2N7,4N,4N5,5N Color: Metallic Color Surface: Polished Surface Shape: Flat target, Rotating target Application:X-Ray Generation, Electron Beam Evaporation, High-Temperature Components Product

Metal Target

Factory Direct Supply Sputtering Target Titanium Material for Industrial Application

US$ 55-85 / Piece
1 Piece  (MOQ)
Product Description Target material is the target material bombarded by high-speed charged particles. By replacing different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), different film systems (such as superhard, wear-resistant, corrosion-resistant a

ISO · Ceramic Target · Plate

Boron Nitride Sputtering Target 99.9% Ceramic Materials Customized Size

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Boron Nitride sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact th

Metal Target

Customized Rare Earth Cerium Sputtering Target Materials Round Disk

US$ 55-85 / Piece
1 Piece  (MOQ)
Product Description Target material is the target material bombarded by high-speed charged particles. By replacing different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), different film systems (such as superhard, wear-resistant, corrosion-resistant a

Metal Target · Round

High Purity Gold Sputtering Target Material Custom Processing

US$ 240000 / Piece
1 Piece  (MOQ)
Since the year 2009, our company has been investing and developing the technology of vacuum sputtering thin film coating and evaporation coating for chips of semi-conductor and mirco-electronics, etc. Under technical supports from reserch institutes and doctors/professors of overseas returnees, afte

Alloy Target · Pipe

Custom Niv7 Sputtering Targets 99.9% Pure Nickel Vanadium Alloy Material Supplier

US$ 55-120 / Piece
1 Piece  (MOQ)
Product Description XinKang Factory Presents: Supreme Quality 99.9%-99.995% Purity NiV Magnetron Nickel Vanadium Sputtering Target NiV7wt% for PVD Coating Name Metal Nickel Vanadium Alloy Sputtering Targets (NiV7 Targets) Material Nickel Vanadium Alloy Metal Materials Purity 99.9%-99.995%,

High Purity Sputter Coating Platinum Target, Pure 99.95% Platinum Metal Magnetron Sputtering Target Material

US$ 33000-70000 / Piece
1 Piece  (MOQ)
Product Description Platinum target Pt≥99.95% Pt≥99.95% Diameter 20300mm, thickness 160mm according to requirements Application:sputter coating Impurity element ≯ Pd Ru Rh Ir Au Ag Cu Fe Ni 0.01 0.02 0.02 0.02 0.01 0.005 0.005 0.005 0.005 Al Pb Mn Mg Sn Si

Alloy Target · ISO

99.95% Metal Niv7 Rotary Tube Nickel Vanadium Alloy Target Material with Polished Surface

US$ 50-2000 / Piece
1 Piece  (MOQ)
Product Description XinKang Top Ranking Competitive Price Customized Polished Surface 99.95% High Purity NiV7 Nickel Vanadium Alloy Target for PVD Process Name Metal Nickel Vanadium Alloy Sputtering Targets Purity 99.9%-99.99% Size D50.8x3mm, D76.2x6mm,2inch,3inch, As request Ni Boiling

ISO · TUV · CE

Zrb2 Material Disk for Magnetron Sputtering

US$ 150-1000 / Piece
1 Piece  (MOQ)
Product Description Zirconium diboride is an advanced engineering material, heralded for its remarkable versatility across various fields. Boasting impressive characteristics, such as an exceptionally high melting point, formidable hardness, unparalleled stability, excellent electrical and therm

ISO · Alloy Target · Rotary

Hot Sell Vacuumm Coating Sputtering Target Cuzu Cylindrical Target Material

US$ 0.01-0.09 / Piece
1 Piece  (MOQ)
Rotatable CuZn target Application: Mainly used for producing pure Cu film, widely used in Decorative glass mirror film, PCB plate, TFT-LCD, Low-E glass film, semiconductor electronics. Physical and Chemical Properties Chemical Composition: CuZn Molding process: Spray Density: ≥8.57g/cm3 (
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