Thin Film Deposition Target

551 results for Thin Film Deposition Target

ISO · Ceramic Target · Round

99.99% Pure Chromium Oxide Target for PVD Thin Film Deposition Coating

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Tungsten Disulfide Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. F

ISO · Ceramic Target · Round

Zinc Sulfide Target for Thin Film Deposition with 99.9%-99.99% Purity Packaging

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Zinc Sulfide Sputtering Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy r

ISO · TUV · CE

Buy High Purity Wti10wt% Thin Film Deposition Target Vacuum Forming Packaging

US$ 70-80 / Piece
1 Piece  (MOQ)
Product Description Pioneering Excellence in Sputtering Target and Evaporation Materials Manufacturing Product Name Tungsten titanium sputtering target Available Purity 99.9%min,as you request Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Size 1''- 8'',A

ISO · Metal Target · Round

99.95% Zirconium Target Metal Zr Plate Disc Granules Thin Film Deposition Target

US$ 35-40 / Piece
1 Piece  (MOQ)
Product Description Product Name Zirconium sputtering target Available Purity 99.95%min,as you request Available shape round, rectangular,pellets Size 1''-8'',As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For details,

ISO · Alloy Target · Round

High Purity Nickel Titanium Sputtering Target for Semiconductor Thin Film Deposition

US$ 145-150 / Piece
1 Piece  (MOQ)
Product Description As a premier manufacturer, Changsha Xinkang Advanced Materials Co., Ltd. specializes in creating superior sputtering target and evaporation materials. Product Name Nickel titanium pellets/target Available Purity 99.95%min,as you request Available shape Rectangle, Round,

Metal Target · Round

99.99% CrAl Chromium Aluminum Sputtering Target for Thin Film Deposition

US$ 17-55 / kg
1 kg  (MOQ)
CrAl Chromium Aluminum Sputtering Target Product Name: CrAl Chromium Aluminum Sputtering Target Purity: 99.95%; 2N8,3N,4N Color: Metallic Color Surface: Polished Surface Shape: Flat target, Rotating target Application:Decorative and coating materials Product Parameters Thanks to the toughne

Metal Target · ISO

99.999% Pure Tellurium Sputter Target for Thin Film Deposition

US$ 100-1200 / Piece
1 Piece  (MOQ)
Product Description High Purity 99.999% Pure Tellurium Sputtering Target Material: Tellurium/Te Available purity: 99.99%,99.999% Size: customized Application: PVD coating Company Information Packaging & Shipping Standard export packaging: Vacuum sealed package insid

ISO · Alloy Target · Round

Customized Moti50at% Target for Thin Film Deposition and Sputtering

US$ 75-85 / Piece
1 Piece  (MOQ)
Product Description Product Name Molybdenum titanium alloy target Available Purity 99.5%min,as you request Available shape round, rectangular,pellets Size 1'-10''mm,As per your request Technolgy Sintering or melting Quotation We are factory and can smelt according to customer's alloy

ISO · TUV · CE

Customized Size Wti50wt% High Purity Sputtering Target for Thin Film Deposition

US$ 70-80 / Piece
1 Piece  (MOQ)
Product Description Premium Manufacturer of Sputtering Target and Evaporation Materials Product Name Tungsten titanium sputtering target Available Purity 99.9%min,as you request Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Size 1''- 8'',As per your requ

Round · ISO

99.95% Purity Thin Film Deposition Rhodium Target

US$ 1000-3000 / Piece
1 Piece  (MOQ)
Product Description [brief] Rhodium is silver white metal, the density of 12.7g/cm3, the melting point of 1966 plus or minus 3 DEG C, hard and wear resistant ductile, and good thermal and electrical conductor. Rhodium is chemically inert, at moderate temperatures, it can also resist the erosion
  • QWhat are the common types of Thin Film Deposition Targets used in manufacturing processes?

    Thin Film Deposition Targets used in manufacturing include metals, alloys, and ceramics. Each type has unique properties that make them suitable for specific applications. A reputable supplier can provide guidance on selecting the right material for your manufacturing needs.

  • QHow can I differentiate between reliable Thin Film Deposition Target suppliers in China?

    To identify reliable suppliers in China, research online platforms, attend industry exhibitions, and seek referrals. Look for suppliers with quality certifications and a strong track record. Partnering with a well-known manufacturer ensures consistent quality and timely delivery.

  • QWhat advantages does purchasing Thin Film Deposition Target wholesale offer?

    When you buy Thin Film Deposition Target in wholesale quantities, you benefit from competitive pricing, bulk availability, and customized options. Wholesale orders often come with discounts and flexible terms, making it a cost-effective and convenient choice for manufacturers.

ISO · TUV · CE

Customized Batio3 Thin Film Deposition Target

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Name: BaTiO3 Barium Titanium Oxide (BTO) Ceramic Sputtering Target Category: Target Material Keywords: BaTiO3 Target, Barium Titanium Oxide, BTO Ceramic Sputtering Target Description: Elevate your sputtering operations with our premium BaTiO3 Barium Titanium Oxide Sputtering Target. C

Metal Target · ISO

PVD Target 3n Molybdenum Sputtering Target for Thin Film Deposition

1 Piece  (MOQ)
Product Description PVD target 3N Molybdenum sputtering target Product: Molybdenum sputtering target Purity: 3N5 Size: customized Shape: round or rectangular Technology: Powder metallurgy Application: pvd coating industry Packing: vacuum package, export carton or wooden case outside

Alloy Target · ISO

High Purity Aluminum Magnesium Sputtering Target for Thin Film Deposition

1 pieces  (MOQ)
Products Description Product Name Aluminum Magnesium Sputtering Target (Popular AlMg10wt% AlMg4wt%) Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Available purity 99.9% 99.99% Available size D50.8mm D101.6mm support customized Density / Melting / Techno

Ceramic Target · Round

99.9% Pure Lab6 Sputtering Target Lab6 Target for Thin Film Deposition

US$ 100-1000 / Piece
1 Piece  (MOQ)
Company Information LaB6 Sputtering Target for PVD Coating Packaging & Shipping Standard export packaging: Vacuum sealed package inside; export carton or wooden case outside Shipment can be made by Fedex, DHL, UPS, TNT express etc. for gross weight ≤100KG; For large shipmen

ISO · TUV · CE

Quality Pure Zirconium Ingot Target for Thin Film Deposition

US$ 30-100 / Piece
1 Piece  (MOQ)
Product Description The following table is a component analysis certificate for 3N5 Zr sputtering target. The analytical methods used are: 1. Analysis of metal elements using GDMS or ICP-OES; 2. Gas element analysis using LECO. Elements Actual Spec Units Elements Actual Spec Units El

ISO · Ceramic Target · Round

Vacuum Packaged 99.9% Tantalum Nitride Thin Film Sputtering Targets for Deposition

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name TaN sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact th

ISO · TUV · CE

High Purity Mno2 Sputtering Target for Thin-Film Deposition

US$ 200-1000 / Piece
1 Piece  (MOQ)
Product Name: MnO2 Sputtering Target Category: Target Material Keywords: Mno2 Target, Mno2 Disk, Mno2 Disk Sputter Target, Mno2 Sputtering Target Price, Mno2 Sputter Target Price, Mno2 Magnetron Target, Mno2 Sputter Target, Mno2 Target Sputtering, Mno2 Magnetron Target for PVD, Mno2 PVD Targ

Ceramic Target · ISO

PVD Target Lithium Niobate Linbo3 Sputtering Target for Thin Film Deposition

US$ 235 / Piece
1 Piece  (MOQ)
Product Description PVD target lithium niobate LiNbO3 sputtering target Product: Lithium niobate LiNbO3 sputtering target Purity: 99.9%, 99.99% Size: customized Shape: round or rectangular Technology: HP Application: pvd coating industry Packing: vacuum package, export carton or woode

ISO · TUV · CE

99.5% Pure Tantalum Nitride Deposition Material Tan Target for Thin Film Coating

US$ 500-1000 / Piece
1 Piece  (MOQ)
Product Name: High Purity Tantalum Nitride Sputtering Target TaN Category: Target Material Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technolog

ISO · TUV · CE

High Purity Wti10wt% Vacuum Forming Sputtering Target for Thin Film Deposition

US$ 70-80 / Piece
1 Piece  (MOQ)
Product Description Leading Manufacturer of Premium Sputtering Targets and Evaporation Materials Product Name Tungsten titanium sputtering target Available Purity 99.9%min,as you request Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Size 1''- 8'',As per

ISO · TUV · CE

99.999% Pure Germanium Sputter Target for Thin Film Deposition

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Description Germanium Sputtering Target Supplier Material Germanium Ge Target Purity 99.999% Size Diameter 1","2", 3", 4" or Customized Relative Density above 99% Shape Round, rectangular, granules,or customized Bonding Indium, Elastomer Surface Ground COA Will be

ISO · TUV · CE

99.99% Pure Vo2 Sputtering Target for Thin Film Deposition

US$ 150-1000 / Piece
1 Piece  (MOQ)
Product Description VO2 Sputtering Target Supplier Material VO2 Target Purity 99.99% Size Diameter 1","2", 3", 4" or Customized Relative Density above 80% Shape Round, rectangular, granules,or customized Technology Sinstering Bonding Indium, Elastomer Surface Ground CO

ISO · TUV · CE

99.9% Pure Yttrium Sputtering Target Pure Metal Ytrrium Target for Thin Film Deposition

US$ 150-2500 / kg
1 kg  (MOQ)
Product Description 99.9% Pure Yttrium Sputter Target Supplier Material Yttrium target Purity 99.9% Size Diameter 2", 3",4" or Customized Relative Density above 99% Shape Pieces , granules,or customized Surface Ground COA Will be provided by email after shipment Analysis

ISO · Ceramic Target · Round

High Purity ZnO Ceramic Sputtering Target for Optical Thin Film Deposition

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name ZnO sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact th

Alloy Target

PVD Target Titanium Silicon (TiSi) Alloy Target Tisi Sputtering Target for Thin Film Deposition

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Description PVD target Titanium silicon (TiSi) alloy target Titanium silicon sputtering target Product: Titanium silicon sputtering target Purity: 3N Size: customized Shape: round or rectangular Technology: HIP Application: pvd coating industry Packing: vacuum package, export

Ceramic Target · Round

High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Aluminum Oxide ceramic target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the

ISO · Ceramic Target · Round

High Purity Titanium Oxide Sputtering Target for Thin Film Deposition 99.9% Pure

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Titanium dioxide sputtering target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For details, pl

ISO · Ceramic Target · Round

Customized ZnO/Al2O3 Ceramic Targets for Advanced Thin Film Deposition Processes

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Zinc-aluminium oxide target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio.

Metal Target · Round

99.99% Sio Ceramic Target Silicon Monoxide Sputtering Targets for Thin Film Deposition

US$ 17-55 / kg
1 kg  (MOQ)
SiO Silicon Monoxide Sputtering Targets Product Name: SiO Silicon Monoxide Sputtering Targets Purity: 99.95%; 3N,3N6,4N Color: Metallic Color Surface: Polished Surface Shape: Flat target, Rotating target Application: Semiconductors, Sensors, Optics, Packaging Product Parameters Silicon Mono

ISO · Ceramic Target · Round

Customized Size Silicon Monoxide Ceramic Target for Thin Film Deposition, 99.99% Purity

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Silicon Monoxide Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For d
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