Thin Film Deposition Target

573 results for Thin Film Deposition Target

Round · Metal Target · ISO

99.999% Pure Copper Sputter Target for Thin Film Deposition

US$ 15-1000 / Piece
1 Piece  (MOQ)
Product Description Copper Sputtering Target Supplier Material Cu Target Purity 99.5%-99.9999% Size Diameter 1","2", 3", 4" or Customized Relative Density above 99% Shape Round, rectangular, granules,or customized Technology Vacuum Mealting Bonding Indium, Elastomer Surfac

ISO · Round · Alloy Target

Customized Moti50at% Target for Thin Film Deposition and Sputtering

US$ 75-85 / Piece
1 Piece  (MOQ)
Product Description Product Name Molybdenum titanium alloy target Available Purity 99.5%min,as you request Available shape round, rectangular,pellets Size 1'-10''mm,As per your request Technolgy Sintering or melting Quotation We are factory and can smelt according to customer's alloy

Round · Ceramic Target · ISO

99.5% Pure Tantalum Nitride Deposition Material Tan Target for Thin Film Coating

US$ 500-1000 / Piece
1 Piece  (MOQ)
Product Name: High Purity Tantalum Nitride Sputtering Target TaN Category: Target Material Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technolog

Round · ISO

99.95% Purity Thin Film Deposition Rhodium Target

US$ 1000-3000 / Piece
1 Piece  (MOQ)
Product Description [brief] Rhodium is silver white metal, the density of 12.7g/cm3, the melting point of 1966 plus or minus 3 DEG C, hard and wear resistant ductile, and good thermal and electrical conductor. Rhodium is chemically inert, at moderate temperatures, it can also resist the erosion

Round · Metal Target · ISO

High Purity Rhenium Sputtering Target for Thin Film Deposition

US$ 150-1999 / Piece
1 Piece  (MOQ)
Thin film coating material rhenium sputtering target Product: rhenium sputtering target Purity: 99.95% Size: customized Shape: Planar Packing: Vacumm sealed, wooden case Rhenium Sputtering Target Rhenium is mainly used to manufacture ele

ISO · Round · Alloy Target

99.9% Aluminum Chromium Sputtering Targets for Thin Film Deposition

US$ 75-85 / Piece
1 Piece  (MOQ)
Product Description Product Name Aluminum Chromium Sputering Target Available Purity 99.5%min,as you request Available shape round, rectangular,pellets Size 1'-10''mm,As per your request Technolgy Sintering Quotation We are factory and can smelt according to customer's alloy ratio. Fo

ISO · Round · Metal Target

99.95% Zirconium Target Metal Zr Plate Disc Granules Thin Film Deposition Target

US$ 35-40 / Piece
1 Piece  (MOQ)
Product Description Product Name Zirconium sputtering target Available Purity 99.95%min,as you request Available shape round, rectangular,pellets Size 1''-8'',As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For details,

Round · Alloy Target · ISO

High Purity Wti10wt% Wti50wt% Sputtering Target for Thin Film Deposition

US$ 70-80 / Piece
1 Piece  (MOQ)
Product Description Sputtering target and evaporation materials manufacturer Product Name Tungsten titanium sputtering target Available Purity 99.9%min,as you request Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Size 1''- 8'',As per your request Technolg

Round · Metal Target · ISO

99 99% Pure Magnesium Disk Sputter Target for Thin Film Deposition

US$ 30-1000 / Piece
1 Piece  (MOQ)
Product Description Your Premier Source for Magnesium Sputtering Targets Material Magnesium Target Purity 99.5%-99.99% Size Diameter 1","2", 3", 4" or Customized Relative Density above 99% Shape Round, rectangular, granules,or customized Technology Vacuum Melting Bonding Indiu

ISO · Round · Ceramic Target

High Purity ZnO Ceramic Sputtering Target for Optical Thin Film Deposition

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name ZnO sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact th
  • QWhat are the latest trends in Thin Film Deposition Target manufacturing?

    Recent trends in Thin Film Deposition Target manufacturing highlight sustainable practices and advanced coatings. Major factory innovations focus on reducing costs while offering OEM solutions. Learn how to stay ahead in Thin Film Deposition Target trends by partnering with top industry suppliers for high-performance outcomes.

  • QHow can I find competitive prices for Thin Film Deposition Targets?

    Finding competitive prices involves consulting with multiple suppliers and considering factors like factory-direct options and distributor offers. Factory partnerships often offer wholesale pricing or bulk discounts. Engage with trusted distributors to compare costs and secure the most economical deals for your projects.

  • QCan Thin Film Deposition Targets be customized for specific applications?

    Yes, many suppliers provide custom Thin Film Deposition Target solutions to fit specific industrial requirements. Working directly with a supplier's OEM department can ensure materials meet precise specifications. Customization not only aids specialized applications but also enhances project outcomes at competitive price points. Contact popular vendors to design the perfect solution.

Round · Ceramic Target · ISO

99.99% Pbtio3 Sputtering Target for Thin Film Deposition

US$ 200-1000 / Piece
1 Piece  (MOQ)
Product Description PbTiO3Sputtering Target Supplier Material PbTiO3 Target Purity 99.99% Size Diameter 1","2", 3", 4" or Customized Relative Density above 80% Shape Round, rectangular, granules,or customized Technology Sinstering Bonding Indium, Elastomer Surface Ground

Alloy Target · ISO

99.9% Cocrni Sputtering Target with 99 9% Purity for Thin Film Deposition

US$ 100-1000 / pieces
1 pieces  (MOQ)
Product Description Introducing the XinKang Hot Sale CoCrNi magnetron target - a cutting-edge cobalt chromium nickel alloy target, perfect for precision film coating applications. With a focus on quality, this cobalt-based alloy target stands out in the market, offering unparalleled performance and

Alloy Target

PVD Target Titanium Silicon (TiSi) Alloy Target Tisi Sputtering Target for Thin Film Deposition

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Description PVD target Titanium silicon (TiSi) alloy target Titanium silicon sputtering target Product: Titanium silicon sputtering target Purity: 3N Size: customized Shape: round or rectangular Technology: HIP Application: pvd coating industry Packing: vacuum package, export

Round · Ceramic Target · ISO

Customized Batio3 Thin Film Deposition Target

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Name: BaTiO3 Barium Titanium Oxide (BTO) Ceramic Sputtering Target Category: Target Material Keywords: BaTiO3 Target, Barium Titanium Oxide, BTO Ceramic Sputtering Target Description: Elevate your sputtering operations with our premium BaTiO3 Barium Titanium Oxide Sputtering Target. C

ISO · Round · Alloy Target

High Purity Nickel Titanium Sputtering Target for Semiconductor Thin Film Deposition

US$ 145-150 / Piece
1 Piece  (MOQ)
Product Description As a premier manufacturer, Changsha Xinkang Advanced Materials Co., Ltd. specializes in creating superior sputtering target and evaporation materials. Product Name Nickel titanium pellets/target Available Purity 99.95%min,as you request Available shape Rectangle, Round,

ISO

High Purity 99.99% Lead Target Lead Sputtering Target for Thin Film Deposition

US$ 100-1000 / Piece
1 Piece  (MOQ)
high purity 99.99% lead target Pb sputtering target for PVD coating Material: Pb sputter target Purity: 99.99% Shpe: Plannar Color: Metal Size: Customize Packing: Vacuum sealed package inside; Wooden case outside Delivery: 7-15 days

Round · Ceramic Target · ISO

High Purity Mno2 Sputtering Target for Thin-Film Deposition

US$ 200-1000 / Piece
1 Piece  (MOQ)
Product Name: MnO2 Sputtering Target Category: Target Material Keywords: Mno2 Target, Mno2 Disk, Mno2 Disk Sputter Target, Mno2 Sputtering Target Price, Mno2 Sputter Target Price, Mno2 Magnetron Target, Mno2 Sputter Target, Mno2 Target Sputtering, Mno2 Magnetron Target for PVD, Mno2 PVD Targ

Round · Alloy Target · ISO

Customized Size Wti50wt% High Purity Sputtering Target for Thin Film Deposition

US$ 70-80 / Piece
1 Piece  (MOQ)
Product Description Premium Manufacturer of Sputtering Target and Evaporation Materials Product Name Tungsten titanium sputtering target Available Purity 99.9%min,as you request Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Size 1''- 8'',As per your requ

ISO · Round · Ceramic Target

High Purity 99.99% Ceramic Znse Sputtering Target for Thin Film Deposition Coatings

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name ZnSe Target Sputtering Targets Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy rati

Round · Metal Target · ISO

99.999% Pure Germanium Sputter Target for Thin Film Deposition

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Description Germanium Sputtering Target Supplier Material Germanium Ge Target Purity 99.999% Size Diameter 1","2", 3", 4" or Customized Relative Density above 99% Shape Round, rectangular, granules,or customized Bonding Indium, Elastomer Surface Ground COA Will be

ISO · Round · Ceramic Target

99.99% Purity Silicon Monoxide Sputtering Target for Thin Film Deposition, Vacuum Packaged

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Silicon Monoxide Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For d

Round · Metal Target · ISO

99.9% Pure Yttrium Sputtering Target Pure Metal Ytrrium Target for Thin Film Deposition

US$ 150-2500 / kg
1 kg  (MOQ)
Product Description 99.9% Pure Yttrium Sputter Target Supplier Material Yttrium target Purity 99.9% Size Diameter 2", 3",4" or Customized Relative Density above 99% Shape Pieces , granules,or customized Surface Ground COA Will be provided by email after shipment Analysis

Metal Target · ISO

PVD Target 3n Molybdenum Sputtering Target for Thin Film Deposition

1 Piece  (MOQ)
Product Description PVD target 3N Molybdenum sputtering target Product: Molybdenum sputtering target Purity: 3N5 Size: customized Shape: round or rectangular Technology: Powder metallurgy Application: pvd coating industry Packing: vacuum package, export carton or wooden case outside

Round · Alloy Target · ISO

Buy High Purity Wti10wt% Thin Film Deposition Target Vacuum Forming Packaging

US$ 70-80 / Piece
1 Piece  (MOQ)
Product Description Pioneering Excellence in Sputtering Target and Evaporation Materials Manufacturing Product Name Tungsten titanium sputtering target Available Purity 99.9%min,as you request Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Size 1''- 8'',A

ISO · Round · Ceramic Target

99.99% Pure Chromium Oxide Target for PVD Thin Film Deposition Coating

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Tungsten Disulfide Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. F

Round · Ceramic Target · ISO

99.99% ZnO Sputtering Target Pure ZnO Target for Thin Film Deposition

US$ 50-1000 / Piece
1 Piece  (MOQ)
Product Description ZnO Zinc Oxide Sputtering Target Supplier Material ZnO Target Purity 99.5% Size Diameter 1","2", 3", 4" or Customized Relative Density above 80% Shape Round, rectangular, granules,or customized Technology Sinstering Bonding Indium, Elastomer Surface

Alloy Target · ISO

High Purity Alloy Cobalt Nickel Sputtering Target for Thin Film Deposition

US$ 100-1000 / pieces
1 pieces  (MOQ)
Product Description XinKang High Purity 99.95% Metal Cobalt Sputtering Target - An exquisite choice for superior precision in film coating! Available in versatile sizes including 1 inch, 3 inch, and customizable dimensions to suit every intricate need, these Co Cobalt Targets are engineered to perf

Round · Ceramic Target · ISO

99.99% Sno2 Sputtering Target for Thin Film Deposition

US$ 110-500 / Piece
1 Piece  (MOQ)
Thin film coating materials tin oxide sputtering target Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound materials. As ceramic sputtering targets are very fragile with very bad thermal cond

Round · Metal Target · ISO

Quality Pure Zirconium Ingot Target for Thin Film Deposition

US$ 30-100 / Piece
1 Piece  (MOQ)
Product Description The following table is a component analysis certificate for 3N5 Zr sputtering target. The analytical methods used are: 1. Analysis of metal elements using GDMS or ICP-OES; 2. Gas element analysis using LECO. Elements Actual Spec Units Elements Actual Spec Units El

ISO · Round · Ceramic Target

Customized ZnO/Al2O3 Ceramic Targets for Advanced Thin Film Deposition Processes

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Zinc-aluminium oxide target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio.
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