Thin Film Deposition Target

553 results for Thin Film Deposition Target

Ceramic Target · ISO · Round

High Purity Silicon Monoxide Sputtering Target for Thin Film Deposition, Vacuum Packaged

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Silicon Monoxide Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For d

Ceramic Target · ISO · Round

Zinc Sulfide Target for Thin Film Deposition with 99.9%-99.99% Purity Packaging

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Zinc Sulfide Sputtering Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy r

Ceramic Target · ISO · Round

Customized ZnO/Al2O3 Ceramic Targets for Advanced Thin Film Deposition Processes

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Zinc-aluminium oxide target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio.

Alloy Target · ISO · Round

High Purity Nickel Titanium Sputtering Target for Semiconductor Thin Film Deposition

US$ 145-150 / Piece
1 Piece  (MOQ)
Product Description As a premier manufacturer, Changsha Xinkang Advanced Materials Co., Ltd. specializes in creating superior sputtering target and evaporation materials. Product Name Nickel titanium pellets/target Available Purity 99.95%min,as you request Available shape Rectangle, Round,

Alloy Target · ISO · Round

Customized Moti50at% Target for Thin Film Deposition and Sputtering

US$ 75-85 / Piece
1 Piece  (MOQ)
Product Description Product Name Molybdenum titanium alloy target Available Purity 99.5%min,as you request Available shape round, rectangular,pellets Size 1'-10''mm,As per your request Technolgy Sintering or melting Quotation We are factory and can smelt according to customer's alloy

Alloy Target

PVD Target Titanium Silicon (TiSi) Alloy Target Tisi Sputtering Target for Thin Film Deposition

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Description PVD target Titanium silicon (TiSi) alloy target Titanium silicon sputtering target Product: Titanium silicon sputtering target Purity: 3N Size: customized Shape: round or rectangular Technology: HIP Application: pvd coating industry Packing: vacuum package, export

Ceramic Target · ISO · Round

Customized Size Chromium Oxide Sputtering Target for Thin Film Deposition Coating

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Tungsten Disulfide Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. F

Ceramic Target · Round · ISO

99.5% Pure Tantalum Nitride Deposition Material Tan Target for Thin Film Coating

US$ 500-1000 / Piece
1 Piece  (MOQ)
Product Name: High Purity Tantalum Nitride Sputtering Target TaN Category: Target Material Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technolog

Ceramic Target · ISO · Round

High Purity Titanium Oxide Sputtering Target for Thin Film Deposition 99.9% Pure

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Titanium dioxide sputtering target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For details, pl

Ceramic Target · Round

High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name Aluminum Oxide ceramic target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy Melting Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the
  • QWhat are the common types of Thin Film Deposition Targets used in manufacturing processes?

    Thin Film Deposition Targets used in manufacturing include metals, alloys, and ceramics. Each type has unique properties that make them suitable for specific applications. A reputable supplier can provide guidance on selecting the right material for your manufacturing needs.

  • QHow can I differentiate between reliable Thin Film Deposition Target suppliers in China?

    To identify reliable suppliers in China, research online platforms, attend industry exhibitions, and seek referrals. Look for suppliers with quality certifications and a strong track record. Partnering with a well-known manufacturer ensures consistent quality and timely delivery.

  • QWhat advantages does purchasing Thin Film Deposition Target wholesale offer?

    When you buy Thin Film Deposition Target in wholesale quantities, you benefit from competitive pricing, bulk availability, and customized options. Wholesale orders often come with discounts and flexible terms, making it a cost-effective and convenient choice for manufacturers.

Alloy Target · ISO · Round

99.9% Aluminum Chromium Sputtering Targets for Thin Film Deposition

US$ 75-85 / Piece
1 Piece  (MOQ)
Product Description Product Name Aluminum Chromium Sputering Target Available Purity 99.5%min,as you request Available shape round, rectangular,pellets Size 1'-10''mm,As per your request Technolgy Sintering Quotation We are factory and can smelt according to customer's alloy ratio. Fo

Metal Target · Round · ISO

99.999% Pure Germanium Sputter Target for Thin Film Deposition

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Description Germanium Sputtering Target Supplier Material Germanium Ge Target Purity 99.999% Size Diameter 1","2", 3", 4" or Customized Relative Density above 99% Shape Round, rectangular, granules,or customized Bonding Indium, Elastomer Surface Ground COA Will be

Metal Target · Round · ISO

99.999% Pure Copper Sputter Target for Thin Film Deposition

US$ 15-1000 / Piece
1 Piece  (MOQ)
Product Description Copper Sputtering Target Supplier Material Cu Target Purity 99.5%-99.9999% Size Diameter 1","2", 3", 4" or Customized Relative Density above 99% Shape Round, rectangular, granules,or customized Technology Vacuum Mealting Bonding Indium, Elastomer Surfac

Ceramic Target · ISO · Round

99.99% Purity Silicon Monoxide Sputtering Target for Thin Film Deposition, Vacuum Packaged

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Silicon Monoxide Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For d

Ceramic Target · ISO · Round

Customized Size Silicon Monoxide Ceramic Target for Thin Film Deposition, 99.99% Purity

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Silicon Monoxide Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For d

Alloy Target · Round · ISO

High Purity Wti10wt% Wti50wt% Sputtering Target for Thin Film Deposition

US$ 70-80 / Piece
1 Piece  (MOQ)
Product Description Sputtering target and evaporation materials manufacturer Product Name Tungsten titanium sputtering target Available Purity 99.9%min,as you request Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Size 1''- 8'',As per your request Technolg

Metal Target · ISO

99.999% Pure Tellurium Sputter Target for Thin Film Deposition

US$ 100-1200 / Piece
1 Piece  (MOQ)
Product Description High Purity 99.999% Pure Tellurium Sputtering Target Material: Tellurium/Te Available purity: 99.99%,99.999% Size: customized Application: PVD coating Company Information Packaging & Shipping Standard export packaging: Vacuum sealed package insid

Alloy Target · ISO

High Purity Aluminum Magnesium Sputtering Target for Thin Film Deposition

1 pieces  (MOQ)
Products Description Product Name Aluminum Magnesium Sputtering Target (Popular AlMg10wt% AlMg4wt%) Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Available purity 99.9% 99.99% Available size D50.8mm D101.6mm support customized Density / Melting / Techno

Metal Target · Round

99.99% Sio Ceramic Target Silicon Monoxide Sputtering Targets for Thin Film Deposition

US$ 17-55 / kg
1 kg  (MOQ)
SiO Silicon Monoxide Sputtering Targets Product Name: SiO Silicon Monoxide Sputtering Targets Purity: 99.95%; 3N,3N6,4N Color: Metallic Color Surface: Polished Surface Shape: Flat target, Rotating target Application: Semiconductors, Sensors, Optics, Packaging Product Parameters Silicon Mono

Metal Target · Round · ISO

99.9% Pure Yttrium Sputtering Target Pure Metal Ytrrium Target for Thin Film Deposition

US$ 150-2500 / kg
1 kg  (MOQ)
Product Description 99.9% Pure Yttrium Sputter Target Supplier Material Yttrium target Purity 99.9% Size Diameter 2", 3",4" or Customized Relative Density above 99% Shape Pieces , granules,or customized Surface Ground COA Will be provided by email after shipment Analysis

Alloy Target · Round · ISO

Buy High Purity Wti10wt% Thin Film Deposition Target Vacuum Forming Packaging

US$ 70-80 / Piece
1 Piece  (MOQ)
Product Description Pioneering Excellence in Sputtering Target and Evaporation Materials Manufacturing Product Name Tungsten titanium sputtering target Available Purity 99.9%min,as you request Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request Size 1''- 8'',A

Ceramic Target · ISO · Round

High Purity ZnO Ceramic Sputtering Target for Optical Thin Film Deposition

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Name ZnO sputtering target Available Purity 99.9%min,as you request Available shape round, rectangular,pellets Size 1''- 8''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact th

Ceramic Target · Round · ISO

Zrb2 Sputtering Target for Thin Film Deposition

US$ 150-1000 / Piece
1 Piece  (MOQ)
Elegant Product Description Zirconium diboride is a premier engineering material extensively utilized across diverse domains. It boasts attributes of exceptional melting point, superior hardness, remarkable stability, excellent electrical conductivity, efficient thermal conductivity, unparallele

Ceramic Target · Round · ISO

Customized Batio3 Thin Film Deposition Target

US$ 100-1000 / Piece
1 Piece  (MOQ)
Product Name: BaTiO3 Barium Titanium Oxide (BTO) Ceramic Sputtering Target Category: Target Material Keywords: BaTiO3 Target, Barium Titanium Oxide, BTO Ceramic Sputtering Target Description: Elevate your sputtering operations with our premium BaTiO3 Barium Titanium Oxide Sputtering Target. C

Ceramic Target · Round

99.9% Pure Lab6 Sputtering Target Lab6 Target for Thin Film Deposition

US$ 100-1000 / Piece
1 Piece  (MOQ)
Company Information LaB6 Sputtering Target for PVD Coating Packaging & Shipping Standard export packaging: Vacuum sealed package inside; export carton or wooden case outside Shipment can be made by Fedex, DHL, UPS, TNT express etc. for gross weight ≤100KG; For large shipmen

Metal Target · Round · ISO

Quality Pure Zirconium Ingot Target for Thin Film Deposition

US$ 30-100 / Piece
1 Piece  (MOQ)
Product Description The following table is a component analysis certificate for 3N5 Zr sputtering target. The analytical methods used are: 1. Analysis of metal elements using GDMS or ICP-OES; 2. Gas element analysis using LECO. Elements Actual Spec Units Elements Actual Spec Units El

Ceramic Target · ISO · Round

High Purity 99.99% Ceramic Znse Sputtering Target for Thin Film Deposition Coatings

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name ZnSe Target Sputtering Targets Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20'',As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy rati

Metal Target · Round

99.99% CrAl Chromium Aluminum Sputtering Target for Thin Film Deposition

US$ 17-55 / kg
1 kg  (MOQ)
CrAl Chromium Aluminum Sputtering Target Product Name: CrAl Chromium Aluminum Sputtering Target Purity: 99.95%; 2N8,3N,4N Color: Metallic Color Surface: Polished Surface Shape: Flat target, Rotating target Application:Decorative and coating materials Product Parameters Thanks to the toughne

Ceramic Target · ISO · Round

99.99% Pure Chromium Oxide Target for PVD Thin Film Deposition Coating

US$ 110-120 / Piece
1 Piece  (MOQ)
Product Description Product Name Tungsten Disulfide Target Available Purity 99.99%min,as you request Available shape round, rectangular,pellets Size 1''- 20''mm,As per your request Technolgy powder metallurgy Quotation We are factory and can smelt according to customer's alloy ratio. F

Ceramic Target · Round · ISO

High Purity Mno2 Sputtering Target for Thin-Film Deposition

US$ 200-1000 / Piece
1 Piece  (MOQ)
Product Name: MnO2 Sputtering Target Category: Target Material Keywords: Mno2 Target, Mno2 Disk, Mno2 Disk Sputter Target, Mno2 Sputtering Target Price, Mno2 Sputter Target Price, Mno2 Magnetron Target, Mno2 Sputter Target, Mno2 Target Sputtering, Mno2 Magnetron Target for PVD, Mno2 PVD Targ
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