Basic Info.
Application
Industry, School, Hospital, Lab
Transport Package
Wood Box
Specification
660mm*460mm*580mm
Product Description
Description
Chemical vapor deposition (CVD) is a chemical process used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (SiO2, germanium, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.
Application:
CVD is commonly used to deposit conformal films and augment substrate surfaces in ways that more traditional surface modification techniques are not capable of. CVD is extremely useful in the process of atomic layer deposition at depositing extremely thin layers of material. A variety of applications for such films exist. Gallium arsenide is used in some integrated circuits (ICs) and photovoltaic devices. Amorphous polysilicon is used in photovoltaic devices. Certain carbides and nitrides confer wear-resistance Polymerization by CVD, perhaps the most versatile of all applications.
T1280 Double temperature tube furnace
Technical Parameters
Model | T1280B |
Hearth Model | Open type |
Display Model | Highlight LED display |
Hearth Material | Imported alumina fiber |
Heating Element | Fe-Cr-Al-Mo wire (OCr27Al7Mo2) |
Maximum Temperature | 1200ºC |
Working Temperature | ≤1150ºC |
Heating rate | ≤20ºC (Suggest:10ºC/min) |
Heating zones | Double heating zone |
Heating zone length | 440mm |
Constant temperature zone length | 260mm |
Tube Material | high purity quartz |
Tube diameter | 80mm(inner diameter:54mm) |
Tube Length | 1000mm |
Sealing Method | vacuum flange |
Vacuum Air-tightness | 9.8×10-4Pa |
Control mode | Intelligent PID auto control |
Temperature Accuracy | ±1ºC |
Temperature curve | 30 segments programmable |
Temperature measure element | K-type thermocouple |
Certification | CE certification |
Power Supply | 220V 50Hz |
Rated power | 4.5KW |
After-sales service | 12 month warranty, durable maintaince and repair support |
Packing | 3-ply wooden case |
Accessories | quartz tube,vacuum flange,tube block,o-ring seal,protective glove,crucible hook,user manual. |
Four-way Mass Flowmeter
This mass flowmeter calculate flow according to the gas atomic mass, high accuracy. Main flow-detector using Seven-star high-precision detector, maximum accuracy reach to 0.05 SCCM
Technical Parameters:
Product Name | 4-way Mass Flowmeter |
Model | CHY-4Z |
Flowmeter type | mass flowmeter |
Flowmeter core | 304 stainless steel |
control valve type | electromagnetism control valve |
Tube normalcy | normal close |
Flowmeter shell | Black aluminum shell |
Gas type | Four way |
Interface dimension | 1/4" |
Measure Accuracy | ±1.0%F.S |
linearity | ±0.5%F.S |
repeated accuracy | ±0.2%F.S |
pressure range | -0.1-0.15 MPa |
A way gas measurement range | 0~100SCCM |
B way gas measurement range | 0~200SCCM |
C way gas measurement range | 0~200SCCM |
D way gas measurement range | 0~500SCCM |
Flow control range | 2%~100% |
Zero temperature drift | 0.6F.S(15~35ºC) |
Respond time | 2S |
working temperature | (15~50ºC) |
Accuracy temperature | (15~35ºC) |
Power supply | 220V 50Hz |
Overall dimensions | L700×W600×H580 |
Total weight | 43kg |
vacuum pump
Description:
This vacuum system is connected by high speed direct-connected two stage rotary vane vacuum pump oil seal type varactor and peripheral vacuum module, can be used as main pumping for medium-low vacuum system, also can be used as backing pump for medium-high vacuum system or Ultra High Vacuum system such as lobe pump, diffusion pump and molecular pump, also have oil mist filter and preventing oil return equipment.
Main feature:
1. In-built forced pump, sufficient lubrication and reliable performance.
2. Prevent oil back system is reliable.
3. Keep high vacuum when running gas ballast.
4.Strong ability to drawing-off vapor.
Oil Mist Filter Clamps
Model | CHY-4C |
Pumping speed m/h(L/s) | 50Hz | 4(1.1) |
60Hz | 4.8(1.3) |
Ultimate Partial pressure without gas ballast(Pa) | 5×10-2 |
Ultimate Total pressure without gas ballast(Pa) | 5×10-1 |
Ultimate Total pressure with gas ballast(Pa) | 3 |
Power Supply | AC220V |
Power rating (KW) | 0.4/0.37 |
Intake and exhaust DN (mm) | KF16/25 |
Oil Capacity (L) | 0.6~1 |
Motor speed (rpm) | 50Hz | 1440 |
60Hz | 1720 |
Address:
No. 1 Xianfeng Road, Mazhai Industrial Park, Erqi District, Zhengzhou, Henan, China
Business Type:
Manufacturer/Factory
Business Range:
Chemicals
Management System Certification:
ISO 9001
Company Introduction:
Chengyi Vacuum Tube Furnace serial is widely used in laboratory heat treatment processing, nanomaterial growthing, thin film preparation, small sample annealing, brazing etc. According to different usage, our Vacuum tube furnace has different temperature level for optional, we have 1200c tube furnace, 1500c tube furnace, 1700c tube furnace and our standard chamber dimension has 50mm, 60mm, 80mm, 100mm for choosing. Our tube furnace adopt double layer furnace chamber structure, it can keep the heating chamber from heating leakage, and protect user from over heating dangerous.
If connect our Vacuum tube furnace with Mass Flow controller and vacuum system, it can be a CVD system, this CVD System will be an ideal equipment for laboratory thin film preparation equipment. Such as: Sulfide material, Nanotube, graphene film etc.