Magnetron Sputter Vacuum Coating Machine

Magnetron Sputter Vacuum Coating Machine

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1. Adopting unbalanced sputtering magnetic field structure.
2. Planar magnetron dual-targets closure magnetic field design.
3. MF power supply is used for sputtering deposition of compound films, which can increase sputtering rate and effectively prevent the target poisoning, sparking and anode disappearance and therefore can greatly enhance ionization and obviously increase deposition rate.
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Last Login Date: Jun 16, 2007

Business Type: Manufacturer/Factory, Other

Main Products: Vacuum, Coating, Plating