- Recommend for you
-
What is 8 Inches Anti-Corrosion Heating Type Spin Coater for Silicon Wafer
-
What is Evaporation Plasma Sputter Coating System with Quartz Chamber for Non-Conductor Material Test Electrode
-
What is Manufacturer Independent Research and Development Production Dual-Target RF Magnetron Sputtering Coater
What is Triple Target Plasma Sputtering Coater with Rotatying Heating Stage for Coating Metal Al Mg Li
Price
Purchase Qty. Reference FOB Price
1-4 Pieces US$11,500.00
5+ Pieces US$10,000.00
Sepcifications
- After-sales Service 12 Months
- Warranty 12 Months
- Type Coating Production Line
- Coating Vacuum Coating
- Substrate Steel
- Certification CE
- Condition New
- Transport Package Wooden Box
- Specification 3
- Trademark TN
- Origin Henan China
- Sample Size φ100mm
- Sample Stage to Target Surface 20~35mm Height Adjustable
- Heating Temperature Max 500ºC
- Rotate Speed 1-20rpm Adjustable
- Chamber Size φ180mm×200mm
- Chamber Material High Purity Quartz
- Mechanical Pump Rotary Vane Pump
- Vacuum Measurement Resistance Gauge
- Opening Mode Top Cover Removable
- Total Power 800W
- Power Supply AC;220V 50/60Hz
- Max Output Power 150W
- Total Weight 30kg
- Temperature Control Accuracy ±1ºC Pid Temperature Control
Product Description
Triple Target Plasma Sputtering Coater with Rotatying heating stage for Coating Metal Al Mg Li Product Description 1. This type of small plasma sputtering coating machine adopts single-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. ...
