43,630 Copper Target
results from991 suppliers
Cu Sputtering Target/Copper Rotary Target for Metal-Coated Conductor/ Semiconductor
- Type: Metal Target
- Shape: Customized
- Certification: ISO, CE
- Purity: Customized
- Color: Brassiness
- Size: Customized
High Purity 99.9995% Copper Cu Sputtering Target for Electronics Ofhc Copper Target
- Type: Drawing Processing
- Shape: Pipe
- Certification: TUV, ISO
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
CuNiTi Alloy Target Copper Nickel Titanium Alloy Sputtering Target for LCD/Touch Panel
- Type: Alloy Target
- Shape: Customized
- Certification: ISO, CE
- Purity: >3n5 >99.95%
- Color: Grey
- Size: Customized
Anode Copper Caps, Rotating Anode Targets for X Ray Tube Insert Parts
- Type: Molybdenum Rhenium Tungstencomposite
- Shape: Round
- Certification: TUV, RoHS,ISO9001
- Apply in: Medical Device Industry and Industrial Detecors
- Making Method: Forging
- Style: Standard
Xinkang High Purity Tantalum Pentoxide Ta2o5 Ceramic Sputtering Targets Bond Copper Panel
- Type: Ceramic Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.9%-99.99%
- Size: D50.8X3mm,D3X3mm, D50.8X3mm, or as Your Request
- OEM: Support
99.99% Pure Copper Aluminum Sputtering Target Cual Target for PVD Coating
- Type: Metal Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.5%-99.99%
- Size: Customized
- MOQ: 1 PC
99.999%High Pure Copper Target (4N-6N) Copper Plate Copper Sputtering Coating Target
- Type: Drawing Processing
- Shape: Pipe
- Certification: TUV, ISO
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
99.99% Pure Metal Copper Sputtering Target
- Type: Metal Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.5%-99.9999%
- Size: Customized
- MOQ: 1 PC
High Pure Copper Target Cu Target Price
- Type: Drawing Processing
- Shape: Pipe
- Certification: TUV, ISO
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
PVD Target Fe2o3 Target Ferric Oxide Sputtering Target with Copper Backing Plate
- Shape: Circular, Rectangular
- Size: Customers' Requirements
- Purity: 3n, 4n
- Chemical Composition: Fe2o3
- Surface: Polished or Grinding
- Advantage: High Purity and Density
Oxygen Free Copper Cu Copper Sputtering Target for Thin Film Coating
- Type: Drawing Processing
- Shape: Pipe
- Certification: TUV, ISO
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
Copper Tungsten Stationary Anode Targets and Molybdenum Rhenium Tungsten Rotating Anode Targets
- Type: Alloy Target
- Shape: Cylinder
- Certification: TUV, RoHS,ISO9001
- Apply in: Medical Device Industry and Industrial Detecors
- Making Method: Back-Casting
- Style: Standard
High-Performance Ceramic Titanium Nitride Sputtering Target with Copper Plate
- Type: Ceramic Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.9%
- Size: D50.8X3mm,D3X3mm, D50.8X3mm, or as Your Request
- OEM: Support
Oxygen Free Copper Vacuum Coating Target Ofhc Copper Tube Target
- Type: Drawing Processing
- Shape: Pipe
- Certification: TUV, ISO
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
High Pure Carbon Target Bonding Copper Plate 99.999% C Ceramic Materials Customzied Size
- Type: Ceramic Target
- Shape: Round
- Certification: ISO
- Packaging: 1PC Vacuum Package
- Purity: 99.9%-99.99%
- Size: Customized
High Purity Copper Sputtering Target Cu Crucible Cu Tube Target
- Type: Drawing Processing
- Shape: Pipe
- Certification: TUV, ISO
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
High Purity 99.95% Nickel Copper Magnetron Alloy Target
- Type: Alloy Target
- Shape: Round
- Purity: 99.9%-99.9999%
- Size: 10X10X10mm, D3X3mm or as Your Request
- OEM: Support
- MOQ: 1kgs
Vacuum Coating Oxygen Free Copper Sputtering Target 99.999 Purity Copper Target Plate
- Type: Drawing Processing
- Shape: Pipe
- Certification: TUV, ISO
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
High Purity Copper Back Target Vacuum Sputtering
- Type: Alloy Target
- Shape: Round
- Purity: 99.99%
- Material: Cu
- Packing: Plywood Box
- Standard: customized
Customize Cu Copper Plate Planar Targets Indium Bond Copper Back Panel
- Type: Metal Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.9%-99.9999%
- Size: D50.8X3mm or as Your Request
- OEM: Support
Cuo-In2o3 Ceramic Targets Copper Oxide - Indium Oxide Sputtering Target
- Type: Metal Target
- Shape: Round
- Sample: Available
- Delivery: Prompt
- Package: 25kg/Drum
- Size: Customized
High Purity 99.99% Zrcu Zirconium Copper Alloy Sputtering Target
- Type: Metal Target
- Shape: Round
- Sample: Available
- Delivery: Prompt
- Package: 25kg/Drum
- Size: Customized
High-Quality Tin Ceramic Sputtering Target with Copper Plate
- Type: Ceramic Target
- Shape: Round
- Certification: TUV, ISO, CE
- Purity: 99.9%
- Size: D50.8X3mm,D3X3mm, D50.8X3mm, or as Your Request
- OEM: Support
High Purity Copper Sulfide Sputtering Target for Efficient PVD Coating
- Application: Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting
- Material: Other
- Type: Ceramic Plate
- Packaging: 1PC Vacuum Forming
- Size: Customized
- Delivery: 7-15days
Xinkang Customized Aluminum Copper Alloy Target Alcu30at% for PVD Coating
- Application: Medical, Industrial, Electronics, Aviation, PVD Coating, Alloy Additives
- Packaging: 1PC Vacuum Forming
- Purity: 99.95%Min
- Size: Customized
- Delivery: 7-15days
- Certificate: ISO9001:2015
Coating Material High Purity Cu Sputtering Copper Target 99.999%
- Type: Drawing Processing
- Shape: Pipe
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
- Powder: Not Powder
99.99% Pure Y2o3 Sputter Targets Bonded with Copper Plate
- Type: Ceramic Target
- Shape: Plannar, Round,
- Certification: ISO
- Usage: Thin Film Coating
- Size: Accept Custom
- Purity: 99.99%
6n Cu Copper Sputtering Target for Thin Film Coating
- Type: Drawing Processing
- Shape: Pipe
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
- Powder: Not Powder
High-Performance Copper Nickel Alloy Sputtering Target for Superior Coating
- Type: Alloy Target
- Shape: Round
- Packaging: 1PC Vacuum Package
- Purity: 99.9%-99.98%
- Size: Customized
- Delivery: 15-18days
Monocrystalline Silicon Sputtering Target Bonding on Copper Backing Plate
- Type: Metal Target
- Shape: Tube Slice Powder Ring Stick
- Certification: TUV, ISO, CE
- Delivery Time: 7 Days
- Packing: Vacuum Wooden Box
- Standard: Customized
Zinc Sulfide Sputtering Target with Copper Backing Plate Bonded
- Type: Ceramic Target
- Shape: Round
- Certification: TUV, ISO, CE
- Material: Zinc Sulfide
- Purity: 99.95%
- Size: Customized
Monocrystalline Silicon Sputtering Target with Copper Backing Plate Bonding
- Type: Ceramic Target
- Shape: Plate
- Certification: SGS
- Delivery Time: 7days
- Packing: Wooden Case
- Standard: according the drawing
99.9%Min PVD Iron Oxide Target with Copper Backing Plate and Customized Size
- Type: Ceramic Target
- Shape: Round
- Certification: ISO
- Packaging: 1PC Vacuum Package
- Purity: 99.9%-99.99%
- Size: Customized
Coating Material High Purity Cu Sputtering Copper Target
- Type: Drawing Processing
- Shape: Pipe
- Application: Vacuum Coating, Surface Treatment
- Purity: >99.99%
- Alloy: Non-Alloy
- Powder: Not Powder
Copper Chromioum Target 99.9% Cucr5% Pure Copper Chromium Sputtering Target
- Type: Alloy Target
- Shape: Round
- Certification: TUV, ISO, CE
- Packaging: 1PC Vacuum Forming
- Purity: 99.99%Min
- Size: Customized
Hot Selling Silicon Sputtering Targets Bonding on Copper Plate for Indonesia
- Type: Metal Target
- Shape: Tube Slice Powder Ring Stick
- Certification: TUV, ISO, CE
- Delivery Time: 7 Days
- Packing: Vacuum Wooden Box
- Standard: Customized
Xinkang Indium Oxide Ceamic Sputtering Target 99.99% In2o3 Disc Bonding Copper Plate
- Type: Ceramic Target
- Shape: Round
- Certification: ISO
- Packaging: 1PC Vacuum Package
- Purity: 99.9%-99.99%
- Size: Customized
Customized Size Copper Chromium Zirconium Alloy Backing Plate Cucrzr Sputtering Targets
- Type: Alloy Target
- Shape: Sheet
- Certification: ISO
- Delivery Time: 15-18days
- Keywords: Copper Chromium Zirconium Sputtering Target
- Size: Diameter 2'',6'',as Your Request
Copper Nickel Titanium Alloy Sputteirng Targets Cuniti Disc Plate Sheet Targets 99.95% Customized
- Type: Alloy Target
- Shape: Round
- Certification: TUV, ISO, CE
- Packaging: 1PC Vacuum Forming
- Purity: 99.99%Min
- Size: Customized
High Purity Nickel Copper Titanium Alloy Sputtering Targets Nicuti 99.9% Disc
- Application: Medical, Industrial, Electronics, Aviation
- Packaging: 1PC Vacuum Package
- Purity: 99.9%-99.98%
- Size: Customized
- Delivery: 15-18days
- Certificate: ISO9001:2015